Dual-sided capacitor and method of formation

ABSTRACT

A dual-sided HSG capacitor and a method of fabrication are disclosed. A thin native oxide layer is formed between a doped polycrystalline layer and a layer of hemispherical grained polysilicon (HSG) as part of a dual-sided lower capacitor electrode. Prior to the dielectric formation, the lower capacitor electrode may be optionally annealed to improve capacitance.

FIELD OF THE INVENTION

The present invention relates to the field of semiconductor integratedcircuits and, in particular, to dual-sided capacitors.

BACKGROUND OF THE INVENTION

A dynamic random access memory (DRAM) cell typically comprises a chargestorage capacitor coupled to an access device such as aMetal-Oxide-Semiconductor Field Effect Transistor (MOSFET). The MOSFETfunctions to apply or remove charge on the capacitor, thus affecting alogical state defined by the stored charge. The amount of charge storedon the capacitor is determined by the capacitance C=∈∈_(o) A/d, where ∈is the dielectric constant of the capacitor dielectric, ∈_(o) is thevacuum permittivity, A is the electrode (or storage node) area, and d isthe interelectrode spacing. The conditions of DRAM operation, such asoperating voltage, leakage rate and refresh rate, will in generalmandate that a certain minimum charge be stored by the capacitor.

In the continuing trend to higher memory capacity, the packing densityof storage cells must increase, yet each must maintain requiredcapacitance levels. This is a crucial demand of DRAM fabricationtechnologies if future generations of expanded memory array devices areto be successfully manufactured. Nevertheless, in the trend to highermemory capacity, the packing density of cell capacitors has increased atthe expense of available cell area. Yet, design and operationalparameters determine the minimum charge required for reliable operationof the memory cell despite decreasing cell area.

Several techniques have been developed to increase the capacitance ofthe cell capacitor without significantly affecting the cell area. Forexample, capacitor electrodes having textured surface morphology havebeen introduced to increase the interfacial area between the dielectricthin film and the adjacent electrode and, therefore, to increase thecapacitance. For example, in conventional dual-sided (or double-sided)container capacitors, hemispherical grain polysilicon (HSG) has beenintroduced as the material of choice for the double-sided electrodebecause the increased surface area of the HSG electrode and of itsrespective interfacial area is directly proportional to the cellcapacitance. However, current technologies for the formation of adouble-sided HSG electrode involve using HSG on the outside of thecapacitor plate. Accordingly, when two neighboring dual-sided HSGcapacitors are fabricated on a DRAM memory circuit, for example, a shortcircuit between the two dual-sided HSG capacitors may occur and thus,may negatively affect the characteristics of the device.

Accordingly, as memory cell density continues to increase, there is aneed for an improved method for forming a dual-sided HSG containercapacitor having increased capacitance per cell and low leakage, as wellas a method of forming a capacitor structure that achieves high storagecapacitance without increasing the size of the capacitor and without ashort circuit between the capacitor structure and an additional adjacentcapacitor.

SUMMARY OF THE INVENTION

The present invention provides a dual-sided HSG capacitor comprising anative oxide layer as part of a lower electrode, as well as a method offorming a dual-sided HSG capacitor with low leakage and high capacitanceand further without a short circuit between the dual-sided HSG capacitorand an additional adjacent capacitor.

The thin native oxide layer is formed between a doped polycrystallinelayer and a layer of hemispherical grained polysilicon (HSG) to suppressthe diffusion of silicon atoms and dopants from the dopedpolycrystalline layer into the layer of hemispherical grainedpolysilicon (HSG) during a seeding and anneal treatment. This way, theformation of large grains of hemispherical grained polysilicon issubstantially reduced on the doped polycrystalline layer during theseeding and anneal treatment. Prior to the formation of the thin nativeoxide layer, the doped polycrystalline layer may be optionally subjectedto a cleaning solution. Prior to the dielectric formation, the lowercapacitor electrode may be optionally PH₃ annealed. A dielectric layerof a high-dielectric constant material, for example of aluminum oxide(Al₂O₃) or tantalum oxide (Ta₂O₅), and an upper capacitor electrode arefabricated over the lower capacitor electrode.

The present invention also provides a method of forming a dual-sided HSGcapacitor with reduced leakage current and high capacitance. A thinnative oxide layer is formed as part of a lower electrode over a dopedpolycrystalline layer, and between the doped polycrystalline layer and alayer of hemispherical grained polysilicon (HSG). The thin native oxidelayer may be formed by an ex-situ or an in-situ oxidation process at alow partial pressure, or by an ex-situ wet chemical process. The thinnative oxide layer may be also formed by an ex-situ or an in-situ atomiclayer deposition (ALD), or by first depositing a silicon layer and thenremotely oxidizing the silicon layer. Prior to the formation of the thinnative oxide layer, the doped polycrystalline layer may be subjected toa cleaning solution. After its formation and prior to the dielectricformation, the lower capacitor electrode may be optionally subjected toa PH₃ anneal treatment to decrease the resistivity of the thin nativeoxide layer and increase, therefore, the stack capacitance.

A dielectric layer is fabricated over the lower capacitor electrode andafter the optional anneal process. The dielectric layer may be formed byeither a deposition technique, for example chemical vapor deposition(CVD), or by an atomic layer deposition (ALD) method. An upper electrodeof a conductive material is formed over the dielectric layer by adeposition technique, for example chemical vapor deposition (CVD).

The foregoing and other advantages and features of the invention will bebetter understood from the following detailed description of theinvention, which is provided in connection with the accompanyingdrawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic cross-sectional view of a portion of a memory DRAMdevice, in which a dual-sided HSG capacitor will be fabricated accordingto a method of the present invention.

FIG. 2 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 1.

FIG. 3 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 2.

FIG. 4 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 3.

FIG. 5 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 4.

FIG. 6 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 5.

FIG. 7 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 6.

FIG. 8 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 7.

FIG. 9 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 8.

FIG. 10 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 9.

FIG. 11 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 10.

FIG. 12 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 11.

FIG. 13 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 12.

FIG. 14 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 13.

FIG. 15 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 14.

FIG. 16 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 15.

FIG. 17 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 16.

FIG. 18 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 12.

FIG. 18 is a schematic cross-sectional view of the FIG. 1 device at astage of processing subsequent to that shown in FIG. 17.

FIG. 19 is an illustration of a computer system having a memory devicewith a dual-sided HSG capacitor constructed in accordance with thepresent invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

In the following detailed description, reference is made to variousspecific embodiments in which the invention may be practiced. Theseembodiments are described with sufficient detail to enable those skilledin the art to practice the invention, and it is to be understood thatother embodiments may be employed, and that various structural, logical,and electrical changes may be made without departing from the spirit orscope of the invention.

The term “substrate” used in the following description may include anysemiconductor-based structure that has a silicon surface. Structure mustbe understood to include silicon, silicon-on insulator (SOI), silicon-onsapphire (SOS), doped and undoped semiconductors, epitaxial layers ofsilicon supported by a base semiconductor foundation, and othersemiconductor structures. The semiconductor also need not besilicon-based. The semiconductor could be silicon-germanium, germanium,or gaillium arsenide. When reference is made to a substrate in thefollowing description, previous process steps may have been utilized toform regions or junctions in or on the base semiconductor or foundation.

Referring now to the drawings, where like elements are designated bylike reference numerals, FIG. 1 depicts a memory cell construction for aDRAM at an intermediate stage of the fabrication, in which a pair ofmemory cells having respective access transistors are formed on asubstrate 12. The FIG. 1 structure includes the substrate 12 having awell 13, which is typically doped to a predetermined conductivity, forexample p-type or n-type depending on whether NMOS or PMOS transistorswill be formed therein. The structure further includes field oxideregions 14, conventional doped active areas 16 for use as source/drainregions, and gate stacks 30, all formed according to well-knownsemiconductor processing techniques. The gate stacks 30 include a gateoxide layer 18, a conductive gate layer 20, such as polysilicon orpolysilicon covered by a silicide, nitride spacers 32 and a nitride cap22.

Above the gate oxide region 18, the polysilicon gates 20, and theprotective nitride regions 22, 32, a first insulating layer 24 (FIG. 1)is disposed. Insulating layer 24 could be formed of silicon oxide,borophosphosilicate glass (BPSG), borosilicate glass (BSG), orphosphosilicate glass (PSG), among others.

Reference is now made to FIG. 2, which for simplicity illustrates only alateral portion, for example, the right side portion of FIG. 1. This isa region where a contact plug and an overlying dual-sided HSG capacitorstructure 100 (FIG. 16) fabricated according to exemplary embodiments ofthe present invention will be formed. To create a contact opening 40(FIG. 3) into the substrate 12 through the first insulating layer 24, aphotoresist material 26 (FIG. 2) is deposited and patterned usingconventional photolithography steps. After patterning, an initialopening 27 (FIG. 2) is formed in the photoresist layer 26 for subsequentoxide etching. The first insulating layer 24 of FIG. 2 is then etched,to form a contact opening 40, and the photoresist layer 26 is removed,as shown in FIG. 3. The contact opening 40 extends to the source/drainregion 16 provided in the well 13 of the substrate 12.

Next, contact opening 40 (FIG. 3) is filled with a conductive material,such as doped polysilicon, that is planarized down to or near the planarsurface of the first insulating layer 24, to form a polysilicon plug orfiller 50, as illustrated in FIG. 4. The polysilicon plug 50 is thenanisotropically etched until its top surface is recessed below theplanar surface of the first insulating layer 24, so that a metal layer52 (FIG. 5) can be deposited and planarized, as shown in FIG. 5. Themetal layer 52, which may be of titanium (Ti), for example, is formed onthe polysilicon plug 50 by CVD, PVD, sputtering or evaporation, to athickness of about 60 to about 200 Angstroms. If titanium is employed,then the metal layer 52 will form a metal silicide, for example titaniumsilicide (TiSi₂), during a later high temperature anneal. Although thepresent invention is described with reference to the formation of adual-sided HSG capacitor 100 (FIG. 17) over the polysilicon plug 50,including the metal layer 52, it must be understood that the existenceof the metal layer 52 is optional, and that the present invention alsoapplies to capacitors formed over polysilicon plugs without protectivemetal layer 52.

FIG. 6 illustrates the deposition of a second insulating layer 25, whichcould be, for example, a silicon oxide, borophosphosilicate glass(BPSG), borosilicate glass (BSG), phosphosilicate glass (PSG), ortetraethylortho silicate (TEOS). The second insulating layer 25 isdeposited over the barrier layer 52 and the first insulating layer 24.Again, using the same fabrication technique as that used for theformation of contact opening 40 (FIG. 3) through the first insulatinglayer 24, a capacitor opening 41 (FIG. 7) is formed through the secondinsulating layer 25.

Subsequent to the formation of capacitor opening 41 of FIG. 7, a dopedpolycrystalline layer 60 is formed inside the capacitor opening 41 andover the upper surface of the second insulating layer 25, as illustratedin FIG. 8. The doped polycrystalline layer 60 may be formed ofhemispherical grained polysilicon (HSG), silicon, germanium, or anyalloy of silicon or germanium to increase capacitance. Preferably, thedoped polycrystalline layer 60 is formed of hemispherical grainedpolysilicon (HSG). If HSG is used, the doped polycrystalline layer 60may be formed to a thickness of about 50 Angstroms to about 200Angstroms by depositing a layer of in-situ doped polysilicon.Alternatively, the doped polycrystalline layer 60 may be provided byin-situ arsenic doping of an entire HSG layer. The doped polycrystallinelayer 60 is in electrical contact with the previously formed conductiveplug 50 over the active area 16. For simplicity, the dopedpolycrystalline layer 60 will be referred to hereinafter as dopedpolysilicon layer 60.

According to an embodiment of the present invention, if the dopedpolysilicon layer 60 is formed of HSG, the doped polysilicon layer 60may be further subjected to a cleaning solution, for example, a dilutesolution of hydrofluoric acid (HF) with a 10:1 volumetric ratio of waterto 49% HF, to remove any impurities and/or residue formed over the dopedpolycrystalline layer 60.

Referring now to FIG. 9, a thin native oxide layer 62 is formed over thedoped polysilicon layer 60 to a thickness of about 5 Angstroms to about50 Angstroms. The thin native oxide layer 62 may be formed by variousmethods, for example, ex-situ or in-situ thermal processing, ex-situ wetchemical processing, or ex-situ or in-situ atomic layer deposition(ALD), among others.

For example, and in accordance with an embodiment of the presentinvention, the thin native oxide layer 62 may be formed by an in-situoxidation of the doped polysilicon material forming the dopedpolysilicon layer 60. This way, oxygen (O₂) may be bled over the dopedpolysilicon layer 60 at a low partial pressure, of about 10⁻⁶ Torr, andfor about 1-5 minutes, to form the thin native oxide layer 62 of FIG. 9.Those skilled in the art would realize that increasing the partialpressure of the low pressure oxidation process will proportionatelydecrease the oxidation time.

According to another embodiment of the present invention, the thinnative oxide layer 62 may be formed by first depositing a thin dopedsilicon layer over the doped polysilicon layer 60 and subsequentlyoxidizing the thin doped silicon layer to form the thin native oxidelayer 62 (FIG. 9). For example, a dopes silicon layer with a thicknessof about 5 Angstroms to about 50 Angstroms may be first formed over thedoped polysilicon layer 60, by a chemical vapor deposition process, forexample, in a first processing chamber. Subsequent to the deposition ofthe doped silicon layer, the substrate 12 is removed from the firstprocessing chamber to a second processing chamber in which oxidation ofthe doped silicon layer may take place under an ozone (O₃) treatment,for example, for about 2 minutes to about 2 hours, to form the thinnative oxide layer 62.

According to yet another embodiment of the present invention, the thinnative oxide layer 62 may be grown, for example, at a temperature ofabout 25° C. (room temperature) to about 1100° C., preferably at atemperature less than about 900° C., for about 1 second to about 10minutes, using a gas ambient containing atomic oxygen. The atomic oxygencan be supplied by in-situ steam generation. In other words, acombination of O₂ and H₂ at a hot wafer surface, or a surface in closeproximity, is utilized wherein steam and atomic oxygen is formed andavailable for oxidation. Also, atomic oxygen can be supplied by an ozonesource, plasma source, microwave source or photoexcitation.

The thin native oxide layer 62 may be also formed by an ex-situ or anin-situ atomic layer deposition (ALD) process. According to the ALDembodiment, a first species of silicon precursor, such as an siliconsource precursor, for example silane or a multiple-order silane such asdi-silane or tri-silane, is first deposited over the surface of thedoped polysilicon layer 60 (FIG. 8) as a first monolayer. A secondspecies of oxygen precursor, which may be an oxygen (O₂) or an ozone(O₃) source, or water (H₂O) for example, is next applied over themonolayer of the first species of precursor. The second species ofprecursor reacts with the monolayer of the first species of precursor toform a silicon oxide layer. The sequence of depositing the monolayers ofthe first and second species of precursors is repeated cycle after cycleand as often as needed, until the thickness for the thin native oxidelayer 62 (FIG. 9) is of about 5 Angstroms to about 50 Angstroms.

Reference is now made to FIG. 10. After the formation of the thin nativeoxide layer 62, an amorphous undoped silicon layer 64 is subsequentlyformed over the thin native oxide layer 62 to a thickness of about 100Angstroms to about 300 Angstroms. The amorphous undoped silicon layer 64may be formed, for example, by depositing amorphous silicon by achemical vapor deposition process (CVD) or by plasma enhanced chemicalvapor deposition (PECVD).

After the formation of the amorphous undoped silicon layer 64, thecapacitor opening 41 (FIG. 10) is next filled with a photoresistmaterial (not shown) by, for example, spin coating at room temperatureand then solidifying it. The photoresist material can be anyphotochemical resin used in the semiconductor industry. Thereafter, thephotoresist material and the horizontal portions of the dopedpolysilicon layer 60, the thin native oxide layer 62 and the amorphousundoped silicon layer 64 located above the second insulating layer 25,are planarized by CMP down to or near the planar surface of the uppersurface of the second insulating layer 25 to form a photoresist plug 66(FIG. 11).

Next, the CMP polished photoresist plug 66 (FIG. 11) is removed usingconventional techniques, such as ashing or plasma etching, to form thestructure of FIG. 12. This way, the portions of the doped polysiliconlayer 60, of the thin native oxide layer 62 and of the undoped siliconlayer 64 remaining inside the capacitor opening 41 are electricallyisolated. Upon removal of the photoresist plug 66, the undoped siliconlayer 64 may be optionally cleaned with a dilute etching solution, forexample, a dilute solution of hydrofluoric acid (HF) having a 10:1volumetric ratio of water to 49% HF, to remove any impurities and/ormaterial residue present on the undoped silicon layer 64.

Referring now to FIG. 13, portions of the second insulating layer 25 areetched back around the doped polysilicon layer 60 to expose at least aportion of the doped polysilicon layer 60. The portions of the secondinsulating layer 25 are preferably removed by employing an etchantcontaining a dilute solution of hydrofluoric acid (HF), such as a 10:1volumetric ratio of water to 49% HF solution; however, the invention isnot limited to this particular etchant and any method of exposing thedoped polysilicon layer 60 or of removing portions of the secondinsulating layer 25 from around the doped polysilicon layer 60 is withinthe scope of the present invention. Although FIG. 13 illustratesremaining portions 25 a of the second insulating layer 25, the presentinvention is not limited to this embodiment. Accordingly, the presentinvention also contemplates the removal of the whole second insulatinglayer 25 to completely expose the doped polysilicon layer 60.

Subsequent to the exposure of at least a portion of the dopedpolysilicon layer 60, the amorphous undoped silicon layer 64 issubjected to a seeding and anneal treatment. Accordingly, silicon nucleiwhich will eventually form hemispherical grains are selectively seededwithin the amorphous undoped silicon layer 64. The seeding can takeplace by employing a silicon source such as silane (SiH₄) or di-silane(SiH₆), for example, for about 1-2 minutes in a high vacuum, at apressure of about 10⁻⁵ Torr to about 10⁻⁸ Torr, and at a temperature ofabout 600° C. to about 700° C.

Subsequent to the selective seeding process, the silicon source isremoved and the amorphous undoped silicon layer 64 comprising the seedednuclei is further subjected to an anneal treatment. This way, under ahigh temperature of about 600° C. to about 700° C., silicon atoms fromthe amorphous undoped silicon layer 64 migrate towards the seeded nucleito form a hemispherical grained (HSG) polysilicon layer 64 a havinglarge hemispherical grains, as illustrated in FIG. 14. The largehemispherical grains of the hemispherical grained (HSG) polysiliconlayer 64 a are formed to a thickness “T” (FIG. 14) of about 100Angstroms to about 500 Angstroms.

During the formation of the hemispherical grained (HSG) polysiliconlayer 64 a and as a result of the heat treatment, a thermally annealeddoped polysilicon layer 60 a (FIG. 14) is also formed at the exposedportion of the doped polysilicon layer 60. The annealed dopedpolysilicon layer 60 a comprises small HSG grains which are formed as aresult of the diffusivity of silicon atoms and seeded nuclei from theamorphous undoped silicon layer 64 and into the doped polysilicon layer60. However, the presence of the thin native oxide 62 between theamorphous undoped silicon layer 64 and the doped polysilicon layer 60significantly reduces the diffusivity of such silicon atoms and seedednuclei during the anneal treatment. Thus, as a result of the presence ofthe thin native oxide 62, the HSG grains that form on the exposedportion of the doped polysilicon layer 60 are very small. The small HSGgrains of the annealed doped polysilicon layer 60 a have a thickness “t”(FIG. 14) of only few Angstroms, for example, about 10 Angstroms toabout 50 Angstroms. In any event, the thickness “t” of the small HSGgrains formed on the annealed doped polysilicon layer 60 a mitigatesagainst capacitor-to-capacitor shorts when dual-sided HSG capacitors areformed adjacent one another.

According to an embodiment of the present invention and to furtherimprove the stack capacitance, the hemispherical grained (HSG)polysilicon layer 64 a (FIG. 14) and the thermally annealed dopedpolysilicon layer 60 a (FIG. 14) may be optionally subjected to afurther anneal treatment, such as an in-situ PH₃ anneal at about 750° C.and for about 30 minutes. A nitrogen (N₂) or ammonia (NH₃) plasmaanneal, or any other nitrogen source plasma anneal, may be also employedalong with the PH₃ anneal for doping with phosphorous atoms (from thePH₃ source) the hemispherical grained (HSG) polysilicon layer 64 a andthe doped polysilicon layer 60. This way, as a result of the PH₃ anneal,the thin native oxide layer 62 formed between the hemispherical grained(HSG) polysilicon layer 64 a and the doped polysilicon layer 60 is alsodoped with phosphorous atoms from the phosphate source. The dopant atomsreduce the resistivity of the native oxide and, as a result, the dopedthin native oxide layer 62 forms an ohmic contact and increases theoverall cell capacitance.

According to another embodiment of the present invention and to furtherimprove the capacitance and decrease the leakage, a cleaning step may beperformed before the PH₃ anneal treatment described above. For example,a dilute cleaning solution such as a dilute hydrofluoric acid (HF)solution having a 10:1 volumetric ratio of water to 49% HF may be usedto clean the hemispherical grained (HSG) polysilicon layer 64 a beforethe in-situ PH₃ anneal.

Next, a dielectric layer 68 is formed over the structure of FIG. 14 andthe top surface of the second insulating layer 25, as illustrated inFIG. 15. The dielectric layer 68 may be formed of a high-dielectricconstant (of about 300 or higher) material such as Ta₂O (tantalumpentoxide), Barium Titanate (BT), Strontium Titanate (ST), LeadZirconium Titanate (PZT), or Bismuth Strontium Titanate (BST), amongothers. The dielectric layer 68 (FIG. 15) may be also formed of aluminumoxide (Al₂O₃), zirconium oxide (ZrO₂), hafnium oxide (HfO), ahafnium-aluminum-oxygen alloy (Hf—Al—O), or a lanthanum-aluminum-oxygenalloy (La—Al—O), among others. The dielectric layer 68 may be formed bya deposition technique, for example, such as chemical vapor deposition(CVD), metalorganic chemical vapor deposition (MOCVD) or sputtering, orby atomic layer deposition (ALD), among others, to a thickness of about20 Angstroms to about 100 Angstroms.

Subsequent to the formation of the dielectric layer 68 (FIG. 15), anupper capacitor electrode 70 of a conductive material is formed over thedielectric layer 68, as illustrated in FIG. 16. The upper capacitorelectrode 70 is formed to a thickness of about 50 Angstroms to about 250Angstroms. According to an embodiment of the present invention, theupper capacitor electrode 70 may be formed of a noble metal, noble metalalloys, or conductive noble metal oxides, such as ruthenium oxide orosmium oxide, among others.

The upper capacitor electrode 70 (FIG. 16) may be formed of a metalnitride, for example titanium nitride or tungsten nitride, among others.According to this exemplary embodiment, the metal nitride upperelectrode 70 may be formed, for example, by a chemical vapor deposition(CVD) process using a metal source and a nitrogen source as precursors,at a temperature of about 500° C. to about 800° C., more preferably ofabout 600° C. For example, if a titanium nitride electrode is desired,the titanium nitride upper capacitor electrode 70 may be forihed using anitrogen source, such as an ammonia (NH₃) source, and a titanium sourceprecursor containing chlorine (Cl), such as TiC₄ (titaniumtetrachloride), TiCI₃ (titanium trichloride), (CsH₅)₂TiCl₂[bis(cyclopentadienyl)titanium dichloride] or (C₅H₅)TiCl₃(cyclopentadienyltitanium trichloride), among others.

Alternatively, the titanium nitride upper capacitor electrode 70 (FIG.16) may be formed by a low-temperature chemical vapor deposition (CVD)process by adding (CH₃)HNNH₂ (methylhydrazine) to a titanium sourcecontaining chlorine (Cl), for example TiCI₄ (titanium tetrachloride). Ametalorganic precursor such as TN[CH₂(CH₃)₂]₄ (tetraiis diethylaminotitanium or TDEAT) or Ti[N(CH₃)₂]₄ (tetrakis dimethylamino titanium orTDMAT) may be also used with a nitrogen source precursor to form thetitanium nitride upper electrode 70 of FIG. 16.

FIG. 17 illustrates the dielectric layer 68 and the upper capacitorelectrode 70 patterned by a dry etch to provide areas for additionalcontact plugs to be formed. The invention provides, therefore, adual-sided HSG capacitor 100 having a lower capacitor electrode formedof a thin native oxide sandwiched between a doped polycrystalline layerand an HSG layer, which permits closer spacing of the capacitors in amemory array. Once the dual-sided HSG capacitors 100 of a array areformed, conventional processing techniques are employed to create afunctional memory cell array using capacitors 100.

The dual-sided HSG capacitor 100 (FIG. 17) may be used as a storagecapacitor in a memory cell of a memory device such as a random accessmemory device. For example, FIG. 18 illustrates a portion of a memoryarray area of a DRAM memory device 300 formed in accordance withembodiments of the present invention. As illustrated in FIG. 18, theDRAM memory device 300 includes a pair of memory cells 103 a, 103 bcomprising respective access transistors 30 a, 30 b having onesource/drain region 16 connected to a respective dual-sided HSGcapacitor 100 a, 100 b, formed according to the present invention. FIG.18 also depicts a bit line conductor 89 formed over one or moreinsulating layers, such as insulating layer 97, and which is connectedto the other source/drain region 16 of each of the access transistors 30a, 30 b.

The DRAM memory device 300 (FIG. 18) may be used in a processing systemsuch as the one illustrated in FIG. 19. The exemplary processing system900 of FIG. 19 includes one or more processors 901 coupled to a localbus 904. A memory controller 902 and a primary bus bridge 903 are alsocoupled the local bus 904. The processing system 900 may includemultiple memory controllers 902 and/or multiple primary bus bridges 903.The memory controller 902 and the primary bus bridge 903 may beintegrated as a single device 906.

The memory controller 902 is also coupled to one or more memory buses907. Each memory bus accepts memory components 908. The memorycomponents 908 may be a memory card or a memory module and may includeone or more memory devices 101 containing the dual-sided HSG capacitor100 of the present invention. Examples of memory modules include singleinline memory modules (SIMMs) and dual inline memory modules (DIMMs).The memory components 908 may include one or more additional devices909. For example, in a SIMM or DIMM, the additional device 909 might bea configuration memory, such as a serial presence detect (SPD) memory.The memory controller 902 may also be coupled to a cache memory 905. Thecache memory 905 may be the only cache memory in the processing system.Alternatively, other devices, for example, processors 901 may alsoinclude cache memories, which may form a cache hierarchy with cachememory 905. If the processing system 900 include peripherals orcontrollers which are bus masters or which support direct memory access(DMA), the memory controller 902 may implement a cache coherencyprotocol. If the memory controller 902 is coupled to a plurality ofmemory buses 907, each memory bus 907 may be operated in parallel, ordifferent address ranges may be mapped to different memory buses 907.

The primary bus bridge 903 is coupled to at least one peripheral bus910. Various devices, such as peripherals or additional bus bridges maybe coupled to the peripheral bus 910. These devices may include astorage controller 911, an miscellaneous I/O device 914, a secondary busbridge 915, a multimedia processor 918, and an legacy device interface920. The primary bus bridge 903 may also coupled to one or more specialpurpose high speed ports 922. In a personal computer, for example, thespecial purpose port might be the Accelerated Graphics Port (AGP), usedto couple a high performance video card to the processing system 900.

The storage controller 911 couples one or more storage devices 913, viaa storage bus 912, to the peripheral bus 910. For example, the storagecontroller 911 may be a SCSI controller and storage devices 913 may beSCSI discs. The I/O device 914 may be any sort of peripheral. Forexample, the I/O device 914 may be an local area network interface, suchas an Ethernet card. The secondary bus bridge may be used to interfaceadditional devices via another bus to the processing system. Forexample, the secondary bus bridge may be an universal serial port (USB)controller used to couple USB devices 917 via to the processing system900. The multimedia processor 918 may be a sound card, a video capturecard, or any other type of media interface, which may also be coupled toone additional devices such as speakers 919. The legacy device interface920 is used to couple legacy devices, for example, older styledkeyboards and mice, to the processing system 900.

The processing system 900 illustrated in FIG. 19 is only an exemplaryprocessing system with which the invention may be used. While FIG. 19illustrates a processing architecture especially suitable for a generalpurpose computer, such as a personal computer or a workstation, itshould be recognized that well known modifications can be made toconfigure the processing system 900 to become more suitable for use in avariety of applications. For example, many electronic devices whichrequire processing may be implemented using a simpler architecture whichrelies on a CPU 901 coupled to memory components 908 having the memorydevice 101. These electronic devices may include, but are not limited toaudio/video processors and recorders, gaming consoles, digitaltelevision sets, wired or wireless telephones, navigation devices(including system based on the global positioning system (GPS) and/orinertial navigation), and digital cameras and/or recorders. Themodifications may include, for example, elimination of unnecessarycomponents, addition of specialized devices or circuits, and/orintegration of a plurality of devices.

Although the exemplary embodiments of the present invention have beendescribed for the formation of only one dual-sided HSG capacitor 100(FIG. 17), it must be understood that the present invention contemplatesthe formation of a plurality of such dual-sided capacitor devices.

The above description illustrates preferred embodiments that achieve thefeatures and advantages of the present invention. It is not intendedthat the present invention be limited to the illustrated embodiments.Modifications and substitutions to specific process conditions andstructures can be made without departing from the spirit and scope ofthe present invention. Accordingly, the invention is not to beconsidered as being limited by the foregoing description and drawings,but is only limited by the scope of the appended claims.

1-50. (canceled)
 51. A memory device comprising: an array of memorycells, each memory cell of said array comprising a transistor and acapacitor, said capacitor comprising: a dual-sided electrode comprisingan oxide layer between two conductive layers; a dielectric layer incontact with said dual-sided electrode; and a conductive layer over saiddielectric layer.
 52. The memory device of claim 51, wherein one of saidtwo conductive layers is a doped polycrystalline layer in contact withsaid oxide layer.
 53. The memory device of claim 52, wherein the otherone of said two conductive layers is a layer of hemispherical grainedpolysilicon, said oxide layer being located between said dopedpolycrystalline layer and said layer of hemispherical grainedpolysilicon.
 54. The memory device of claim 51, wherein said oxide layeris a native oxide layer.
 55. The memory device of claim 54, wherein saidnative oxide layer has a thickness of about 5 Angstroms to about 50Angstroms.
 56. The memory device of claim 52, wherein said dopedpolycrystalline layer is formed of a material selected from the groupconsisting of hemispherical grained polysilicon, silicon, germanium, orany alloy of silicon and germanium.
 57. The memory device of claim 51,wherein said dual-sided electrode is a lower electrode of saidcapacitor.
 58. The memory device of claim 51, wherein said dual-sidedelectrode is an PH₃ annealed dual-sided electrode.
 59. The memory deviceof claim 51, wherein said oxide layer is an ALD oxide layer.
 60. Thememory device of claim 51, wherein said oxide layer is a thermally grownoxide layer.
 61. A semiconductor device comprising: an electricalcircuit formed over a semiconductor substrate, said electrical circuitcomprising a capacitor, said capacitor further comprising a dual-sidedcapacitor electrode comprising: an annealed doped polycrystalline layerhaving HSG grains of a first thickness; a layer of hemispherical grainedpolysilicon having HSG grains of a second thickness; and an oxide layerbetween said annealed doped polycrystalline layer and said layer ofhemispherical grained polysilicon.
 62. The semiconductor device of claim61 further comprising an oxide layer between said annealed dopedpolycrystalline layer and said layer of hemispherical grainedpolysilicon.
 63. The semiconductor device of claim 62, wherein saidoxide layer has a thickness of about 5 Angstroms to about 50 Angstroms.64. The semiconductor device of claim 61, wherein said second thicknessis greater than said first thickness.
 65. The semiconductor device ofclaim 61, wherein said second thickness is of about 100 Angstroms toabout 500 Angstroms.
 66. The semiconductor device of claim 61, whereinsaid first thickness is of about 10 Angstroms to about 50 Angstroms. 67.The semiconductor device of claim 61, wherein said dual-sided electrodeis a lower electrode of a capacitor.
 68. A processor system comprising:a processor; and a memory coupled to said processor, at least one ofsaid processor and said memory comprising a capacitor, said capacitorcomprising: a dual-sided electrode comprising an oxide layer between twoconductive layers; a dielectric layer in contact with said dual-sidedelectrode; and a conductive layer over said dielectric layer.
 69. Theprocessor system of claim 68, wherein said oxide layer is a native oxidelayer having a thickness of about 5 Angstroms to about 50 Angstroms. 70.The processor system of claim 68, wherein said native oxide layer isformed between said doped polycrystalline layer and said layer ofhemispherical grained polysilicon.
 71. The processor system of claim 68,wherein said doped polycrystalline layer is formed of a materialselected from the group consisting of hemispherical grained polysilicon,silicon, germanium, or any alloy of silicon and germanium.
 72. Theprocessor system of claim 68, wherein said dual-sided electrode is alower electrode.
 73. The processor system of claim 68, wherein nativeoxide layer is an ALD oxide layer.
 74. The processor system of claim 68,wherein said oxide layer is a thermally grown oxide layer.
 75. Anelectronic system comprising: at least one electrical circuit containinga capacitor, said capacitor comprising: a dual-sided electrodecomprising an oxide layer between two conductive layers; a dielectriclayer in contact with said dual-sided electrode; and a conductive layerover said dielectric layer.
 76. The electronic system of claim 75,wherein one of said two conductive layers is a doped polycrystallinelayer in contact with said oxide layer.
 77. The electronic system ofclaim 76, wherein the other one of said two conductive layers is a layerof hemispherical grained polysilicon, said oxide layer being locatedbetween said doped polycrystalline layer and said layer of hemisphericalgrained polysilicon.
 78. The electronic system of claim 75, wherein saidoxide layer is a native oxide layer.
 79. The electronic system of claim78, wherein said native oxide layer has a thickness of about 5 Angstromsto about 50 Angstroms.
 80. The electronic system of claim 75, whereinsaid dual-sided electrode is a lower electrode of said capacitor. 81.The electronic system of claim 75, wherein said dual-sided electrode isan PH₃ annealed dual-sided electrode.
 82. The electronic system of claim75, wherein said oxide layer is an ALD oxide layer.
 83. The electronicsystem of claim 75, wherein said oxide layer is a thermally grown oxidelayer.